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| DOI | 10.1109/TSM.2024.3365827 |
| Eco-Friendly Dry-Cleaning and Diagnostics of Silicon Dioxide Deposition Chamber | |
| 发表日期 | 2024 |
| ISSN | 0894-6507 |
| EISSN | 1558-2345 |
| 起始页码 | 37 |
| 结束页码 | 2 |
| 卷号 | 37期号:2 |
| 英文摘要 | Semiconductor industry is experiencing a rising demand for environmentally friendly processes with the emphasis on green policies and worldwide environmental sustainability. Nitrogen trifluoride (NF3), the most common plasma chamber cleaning agent gas, poses a significant concern as a potent greenhouse gas since it has global warming potential (GWP), 740 times and 6 times higher than that CO2 and N2O. This study investigated the exhaust gas using quadrupole mass spectroscopy (QMS) and analyzed the change in cleaning speed and the type of exhaust gas through plasma monitoring using optical mass spectroscopy (OES). The objective is to lower the use of the amount of NF3 gas in chamber cleaning process to partially contribute the environmental sustainability in the point of semiconductor manufacturing. When a small amount of N-2 was added to NF3 whose ratio of 7:23, the cleaning efficiency reached to 90% compared to NF3 gas alone. Addition of N-2 positively affected electron density and temperature to increase the F-radical in remote plasma system. In conclusion, 18% of NF3 usage amount was reduced during the Sio(2) deposition chamber cleaning process. |
| 英文关键词 | Cleaning; Plasmas; Noise measurement; Monitoring; Global warming; Semiconductor device measurement; Process control; Climate change; Environmental management; Environmental monitoring; Silicon compounds; Plasma enhanced chemical vapor deposition; chamber cleaning; optical emission spectroscopy; quadrupole mass spectroscopy |
| 语种 | 英语 |
| WOS研究方向 | Engineering ; Physics |
| WOS类目 | Engineering, Manufacturing ; Engineering, Electrical & Electronic ; Physics, Applied ; Physics, Condensed Matter |
| WOS记录号 | WOS:001216618100005 |
| 来源期刊 | IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING
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| 文献类型 | 期刊论文 |
| 条目标识符 | http://gcip.llas.ac.cn/handle/2XKMVOVA/295069 |
| 作者单位 | Myongji University |
| 推荐引用方式 GB/T 7714 | . Eco-Friendly Dry-Cleaning and Diagnostics of Silicon Dioxide Deposition Chamber[J],2024,37(2). |
| APA | (2024).Eco-Friendly Dry-Cleaning and Diagnostics of Silicon Dioxide Deposition Chamber.IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING,37(2). |
| MLA | "Eco-Friendly Dry-Cleaning and Diagnostics of Silicon Dioxide Deposition Chamber".IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING 37.2(2024). |
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