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DOI | 10.3389/fenrg.2023.1234486 |
Advancements in greenhouse gas emission reduction methodology for fluorinated compounds and N2O in the semiconductor industry via abatement systems | |
发表日期 | 2024 |
ISSN | 2296-598X |
起始页码 | 11 |
卷号 | 11 |
英文摘要 | Greenhouse gases (GHGs), particularly fluorinated compounds (FCs), nitrous oxide (N2O), and nitrogen trifluoride (NF3), contribute significantly to climate change, and the semiconductor industry is a notable emitter of these gases. This report introduces an innovative methodology for GHG emission reduction in the semiconductor industry by utilizing advanced abatement systems, referencing Clean Development Mechanism (CDM) published methods AM0078 and AM0111. The proposed methodology shows promising potential, with substantial reductions in FCs, N2O, and NF3 emissions, positioning the semiconductor industry as a key player in climate change mitigation efforts. The main results indicate that by applying the latest abatement systems, a significant reduction in the targeted GHGs can be achieved. The methodology's verification process confirms the effectiveness of GHG reduction, ensuring that semiconductor manufacturing's environmental impact is minimized. Our findings suggest that the implementation of this methodology could lead to industry-wide adoption, resulting in a substantial contribution towards stabilizing atmospheric GHG concentrations. |
英文关键词 | greenhouse gas (GHG); GHG emission reduction; removal methodology; semiconductor industry; gas abatement system |
语种 | 英语 |
WOS研究方向 | Energy & Fuels |
WOS类目 | Energy & Fuels |
WOS记录号 | WOS:001145090600001 |
来源期刊 | FRONTIERS IN ENERGY RESEARCH
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文献类型 | 期刊论文 |
条目标识符 | http://gcip.llas.ac.cn/handle/2XKMVOVA/286932 |
作者单位 | University of Pennsylvania; University of Auckland; Nanyang Technological University |
推荐引用方式 GB/T 7714 | . Advancements in greenhouse gas emission reduction methodology for fluorinated compounds and N2O in the semiconductor industry via abatement systems[J],2024,11. |
APA | (2024).Advancements in greenhouse gas emission reduction methodology for fluorinated compounds and N2O in the semiconductor industry via abatement systems.FRONTIERS IN ENERGY RESEARCH,11. |
MLA | "Advancements in greenhouse gas emission reduction methodology for fluorinated compounds and N2O in the semiconductor industry via abatement systems".FRONTIERS IN ENERGY RESEARCH 11(2024). |
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