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DOI10.1016/j.scib.2020.10.019
Band structure engineering and defect control of Ta3N5 with enhanced photoelectrochemical water oxidation performance
Wu L.; Zhang T.
发表日期2021
ISSN20959273
起始页码651
结束页码652
卷号66期号:7
英文摘要[无可用摘要]
语种英语
来源期刊Science Bulletin
文献类型期刊论文
条目标识符http://gcip.llas.ac.cn/handle/2XKMVOVA/207609
作者单位Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, 100190, China; Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing, 100049, China
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Wu L.,Zhang T.. Band structure engineering and defect control of Ta3N5 with enhanced photoelectrochemical water oxidation performance[J],2021,66(7).
APA Wu L.,&Zhang T..(2021).Band structure engineering and defect control of Ta3N5 with enhanced photoelectrochemical water oxidation performance.Science Bulletin,66(7).
MLA Wu L.,et al."Band structure engineering and defect control of Ta3N5 with enhanced photoelectrochemical water oxidation performance".Science Bulletin 66.7(2021).
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