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DOI | 10.1016/j.scib.2020.10.019 |
Band structure engineering and defect control of Ta3N5 with enhanced photoelectrochemical water oxidation performance | |
Wu L.; Zhang T. | |
发表日期 | 2021 |
ISSN | 20959273 |
起始页码 | 651 |
结束页码 | 652 |
卷号 | 66期号:7 |
英文摘要 | [无可用摘要] |
语种 | 英语 |
来源期刊 | Science Bulletin |
文献类型 | 期刊论文 |
条目标识符 | http://gcip.llas.ac.cn/handle/2XKMVOVA/207609 |
作者单位 | Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing, 100190, China; Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing, 100049, China |
推荐引用方式 GB/T 7714 | Wu L.,Zhang T.. Band structure engineering and defect control of Ta3N5 with enhanced photoelectrochemical water oxidation performance[J],2021,66(7). |
APA | Wu L.,&Zhang T..(2021).Band structure engineering and defect control of Ta3N5 with enhanced photoelectrochemical water oxidation performance.Science Bulletin,66(7). |
MLA | Wu L.,et al."Band structure engineering and defect control of Ta3N5 with enhanced photoelectrochemical water oxidation performance".Science Bulletin 66.7(2021). |
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