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DOI10.1039/c9ee03787j
Novel insights into the charge storage mechanism in pseudocapacitive vanadium nitride thick films for high-performance on-chip micro-supercapacitors
Robert K.; Stiévenard D.; Deresmes D.; Douard C.; Iadecola A.; Troadec D.; Simon P.; Nuns N.; Marinova M.; Huvé M.; Roussel P.; Brousse T.; Lethien C.
发表日期2020
ISSN17545692
起始页码949
结束页码957
卷号13期号:3
英文摘要The Internet of Things, enabled by a worldwide network of interconnected sensors, is limited in its large-scale deployment of nomadic miniaturized devices due to the bounds of energy self-sufficiency. One possible solution, albeit challenging, is constructing on-chip pseudocapacitive micro-supercapacitors. Herein, we achieve the collective fabrication of micro-supercapacitors based on sputtered bi-functional vanadium nitride films acting as the electrode material and as the current collector. The reported surface and volumetric capacitance values (1.2 F cm-2 and >700 F cm-3, respectively) of the 16 μm-thick vanadium nitride film obtained via production-compatible microelectronic deposition methods compete well with those of cutting-edge transition metal oxide/nitride materials, and exceed those of standard carbon electrodes. An arsenal of advanced techniques has been deployed to investigate the pseudocapacitive behavior of sputtered vanadium nitride films in aqueous electrolyte in order to unveil the charge storage process explaining their high capacitance and their improved cycling behavior. This journal is © The Royal Society of Chemistry.
英文关键词Capacitance; Electrodes; Electrolytes; Metal cutting; Microelectronics; Nitrides; Supercapacitor; Thick films; Transition metal oxides; Transition metals; Energy self-sufficiency; Large-scale deployment; Micro supercapacitors; Miniaturized devices; Pseudocapacitive behavior; Vanadium nitride films; Volumetric capacitance; World-wide networks; Vanadium compounds; chemical compound; efficiency measurement; electrode; equipment; film; performance assessment
语种英语
来源期刊Energy & Environmental Science
文献类型期刊论文
条目标识符http://gcip.llas.ac.cn/handle/2XKMVOVA/189682
作者单位Institut d'Electronique de Microélectronique et de Nanotechnologies (IEMN), Université de Lille, CNRS, Centrale Lille, ISEN, Université de Valenciennes, UMR 8520-IEMN, Lille, F-59000, France; Réseau sur le Stockage Electrochimique de l'Energie (RS2E), CNRS FR 3459, 33 rue Saint Leu, Amiens Cedex, 80039, France; Institut des Matériaux Jean Rouxel (IMN), CNRS UMR 6502-Université de Nantes, 2 rue de la Houssinière BP32229, Nantes cedex 3, 44322, France; Unité de Catalyse et de Chimie du Solide (UCCS), Fédération Chevreul, Université de Lille, CNRS, Centrale Lille, ENSCL, Université d'Artois, UMR 8181-UCCS, Lille, F-59000, France
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Robert K.,Stiévenard D.,Deresmes D.,et al. Novel insights into the charge storage mechanism in pseudocapacitive vanadium nitride thick films for high-performance on-chip micro-supercapacitors[J],2020,13(3).
APA Robert K..,Stiévenard D..,Deresmes D..,Douard C..,Iadecola A..,...&Lethien C..(2020).Novel insights into the charge storage mechanism in pseudocapacitive vanadium nitride thick films for high-performance on-chip micro-supercapacitors.Energy & Environmental Science,13(3).
MLA Robert K.,et al."Novel insights into the charge storage mechanism in pseudocapacitive vanadium nitride thick films for high-performance on-chip micro-supercapacitors".Energy & Environmental Science 13.3(2020).
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